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PCE
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DIFF Subgroup
G03F 1/30

Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof

Introduced: January 2012

Full Title

Full titles differ between systems:

IPC:

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Phase shift masks [PSM]; PSM blanks; Preparation thereof > Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof

CPC:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Phase shift masks [PSM]; PSM blanks; Preparation thereof > Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof

No child classifications to compare. This is a leaf node in both IPC and CPC.