CPC Subgroup
B41J 2/44 using single radiation source , e.g. lighting beams or shutter arrangements (B41J2/475 takes precedence)
Full Title
Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed (mounting, arrangement or disposition of types or dies B41J1/00) > characterised by selective application of radiation to a printing material or impression-transfer material > using single radiation source , e.g. lighting beams or shutter arrangements (B41J2/475 takes precedence)
2 direct subcodes
Child Classifications
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- B41J 2/445 using liquid crystals
Top Applicants
Top 10 applicants by patent filingsfor class B41, 2013–2023, worldwide · Source: EPO PATSTAT
- SEIKO EPSON CORPORATION 8,446
- SEIKO EPSON CORPORATION JP 8,438
- HEWLETT-PACKARD DEVELOPMENT COMPANY US 7,828
- CANON JP 5,419
- CANON 4,156
- BROTHER INDUSTRIES JP 3,763
- BROTHER INDUSTRIES 2,779
- RICOH COMPANY JP 2,717
- FUJIFILM JP 2,423
- RICOH COMPANY 1,739