Application

Child Classifications

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• F04C 2220/10 Vacuum
• F04C 2220/20 Pumps with means for separating and evacuating the gaseous phase
• F04C 2220/22 for very low temperatures, i.e. cryogenic
• F04C 2220/24 for metering throughflow
• F04C 2220/26 for step-by-step output movement
• F04C 2220/28 for pulsed fluid flow
• F04C 2220/30 Use in a chemical vapor deposition [CVD] process or in a similar process
• F04C 2220/40 Pumps with means for venting areas other than the working chamber, e.g. bearings, gear chambers, shaft seals
• F04C 2220/50 Pumps with means for introducing gas under pressure for ballasting