CPC Subgroup Additional Only
F04C 2280/02 Preventing solid deposits in pumps, e.g. in vacuum pumps with chemical vapour deposition [CVD] processes
Full Title
Arrangements for preventing or removing deposits or corrosion > Preventing solid deposits in pumps, e.g. in vacuum pumps with chemical vapour deposition [CVD] processes
Top Applicants
Top 10 applicants by patent filingsfor class F04, 2013–2023, worldwide · Source: EPO PATSTAT
- LG ELECTRONICS KR 3,855
- ROBERT BOSCH DE 3,549
- GREE ELECTRIC APPLIANCES 2,273
- GE (GENERAL ELECTRIC COMPANY) US 2,126
- MITSUBISHI ELECTRIC CORPORATION JP 1,881
- UNITED TECHNOLOGIES CORPORATION (UTC) US 1,866
- SAFRAN AIRCRAFT ENGINES FR 1,499
- MITSUBISHI HEAVY INDUSTRIES JP 1,258
- TOYOTA INDUSTRIES CORPORATION JP 1,247
- ATLAS COPCO AIRPOWER BE 1,168