H01S 3/097 by gas discharge of a gas laser
Full Title
Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range (semiconductors lasers H01S5/00) > Processes or apparatus for excitation, e.g. pumping > by gas discharge of a gas laser
Filing statistics
CPC H01S 3/097 belongs to the parent subclass H01S, which recorded 71,652 patent applications worldwide between 2013 and 2023. Annual filings grew from 4,061 in 2013 to 6,752 in 2023 (+66%), peaking at 8,409 applications in 2020. The most active applicants in class H01 are SAMSUNG ELECTRONICS COMPANY (37,897 applications), TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (36,116 applications) and APPLIED MATERIALS (21,640 applications).
Source: EPO PATSTAT, worldwide filings
7 direct subcodes
Child Classifications
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- H01S 3/0971 transversely excited (H01S3/0975 takes precedence)
- H01S 3/0975 using inductive or capacitive excitation
- H01S 3/0977 having auxiliary ionisation means
- H01S 3/0979 Gas dynamic lasers, i.e. with expansion of the laser gas medium to supersonic flow speeds
Top Applicants
Top 10 applicants by patent filingsfor class H01, 2013–2023, worldwide · Source: EPO PATSTAT
- SAMSUNG ELECTRONICS COMPANY KR 37,897
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY TW 36,116
- APPLIED MATERIALS US 21,640
- LG ENERGY SOLUTION KR 20,770
- LG CHEM KR 19,835
- TOKYO ELECTRON JP 18,519
- ROBERT BOSCH DE 14,595
- INTEL CORPORATION US 13,580
- MURATA MANUFACTURING COMPANY JP 12,151
- SAMSUNG SDI COMPANY KR 12,080