CPC Main Group Additional Only
Y10S 148/00 Metal treatment
177 direct subcodes
Child Classifications
Navigate with arrow keys, Enter to open
- Y10S 148/001 Amorphous semiconductor
- Y10S 148/002 Amphoteric doping
- Y10S 148/003 Anneal
- Y10S 148/004 Annealing, incoherent light
- Y10S 148/005 Antimonides of gallium or indium
- Y10S 148/006 Apparatus
- Y10S 148/007 Autodoping
- Y10S 148/008 Bi-level fabrication
- Y10S 148/009 Bi-MOS
- Y10S 148/01 Bipolar transistors-ion implantation
- Y10S 148/011 Bipolar transistors
- Y10S 148/012 Bonding, e.g. electrostatic for strain gauges
- Y10S 148/013 Breakdown voltage
- Y10S 148/014 Capacitor
- Y10S 148/015 Capping layer
- Y10S 148/016 Catalyst
- Y10S 148/017 Clean surfaces
- Y10S 148/018 Compensation doping
- Y10S 148/019 Contacts of silicides
- Y10S 148/02 Contacts, special
Top Applicants
Top 10 applicants by patent filingsfor class Y10, 2013–2023, worldwide · Source: EPO PATSTAT
- BOEING COMPANY US 2,373
- FORD GLOBAL TECHNOLOGIES US 2,244
- HYUNDAI MOTOR COMPANY KR 2,186
- TOYOTA MOTOR CORPORATION JP 1,997
- 3M INNOVATIVE PROPERTIES COMPANY (MINNESOTA MINING AND MANUFACTURING INNOVATIVE PROPERTIES COMPANY) US 1,837
- GE (GENERAL ELECTRIC COMPANY) US 1,794
- SAMSUNG ELECTRONICS COMPANY KR 1,705
- CORNING US 1,569
- TOYOTA MOTOR CORPORATION 1,403
- LG CHEM KR 1,364