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PCE
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DIFF Subgroup
C09G 1/10

based on mixtures of wax and natural or synthetic resin

Introduced: September 1968

Full Title

Full titles differ between systems:

IPC:

Polishing compositions > Other polishing compositions > based on wax > based on mixtures of wax and natural or synthetic resin

CPC:

Polishing compositions (French polish C09F11/00; detergents C11D) > Other polishing compositions > based on wax > based on mixtures of wax and natural or synthetic resin

IPC and CPC are identically structured here. All 1 subcodes exist in both systems.

Child Classifications

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  • C09G 1/12 mixtures of wax and silicon-containing polycondensates IPC+CPC Available in IPC and CPC

Top Applicants

Top Applicants (IPC)

Class C09,2013–2023, worldwide · Source: EPO PATSTAT

  1. LG CHEM KR 6,420
  2. NITTO DENKO CORPORATION JP 5,752
  3. HALLIBURTON ENERGY SERVICES GROUP US 5,650
  4. 3M INNOVATIVE PROPERTIES COMPANY (MINNESOTA MINING AND MANUFACTURING INNOVATIVE PROPERTIES COMPANY) US 5,635
  5. DOW GLOBAL TECHNOLOGIES US 4,844
  6. MERCK PATENT DE 4,779
  7. CHINESE ACADEMY OF SCIENCES 4,311
  8. FUJIFILM JP 4,205
  9. BASF (BADISCHE ANILIN & SODA FABRIK) DE 4,039
  10. SINOPEC (CHINA PETROCHEMICAL CORPORATION) 3,931

Top Applicants (CPC)

Class C09,2013–2023, worldwide · Source: EPO PATSTAT

  1. LG CHEM KR 7,954
  2. HALLIBURTON ENERGY SERVICES GROUP US 6,584
  3. NITTO DENKO CORPORATION JP 6,500
  4. 3M INNOVATIVE PROPERTIES COMPANY (MINNESOTA MINING AND MANUFACTURING INNOVATIVE PROPERTIES COMPANY) US 6,490
  5. DOW GLOBAL TECHNOLOGIES US 6,324
  6. FUJIFILM JP 5,832
  7. MERCK PATENT DE 5,481
  8. BASF (BADISCHE ANILIN & SODA FABRIK) DE 5,147
  9. SAMSUNG DISPLAY KR 5,105
  10. NITTO DENKO CORPORATION 3,584