C09J 129/04 Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
Introduced: January 1990
Full Title
Full titles differ between systems:
Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Adhesives based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Adhesives based on derivatives of such polymers > Homopolymers or copolymers of unsaturated alcohols > Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Adhesives based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Adhesives based on derivatives of such polymers > Homopolymers or copolymers of unsaturated alcohols (C09J129/14 takes precedence) > Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
No child classifications to compare. This is a leaf node in both IPC and CPC.
Top Applicants
Top Applicants (IPC)
Class C09,2013–2023, worldwide · Source: EPO PATSTAT
- LG CHEM KR 6,420
- NITTO DENKO CORPORATION JP 5,752
- HALLIBURTON ENERGY SERVICES GROUP US 5,650
- 3M INNOVATIVE PROPERTIES COMPANY (MINNESOTA MINING AND MANUFACTURING INNOVATIVE PROPERTIES COMPANY) US 5,635
- DOW GLOBAL TECHNOLOGIES US 4,844
- MERCK PATENT DE 4,779
- CHINESE ACADEMY OF SCIENCES 4,311
- FUJIFILM JP 4,205
- BASF (BADISCHE ANILIN & SODA FABRIK) DE 4,039
- SINOPEC (CHINA PETROCHEMICAL CORPORATION) 3,931
Top Applicants (CPC)
Class C09,2013–2023, worldwide · Source: EPO PATSTAT
- LG CHEM KR 7,954
- HALLIBURTON ENERGY SERVICES GROUP US 6,584
- NITTO DENKO CORPORATION JP 6,500
- 3M INNOVATIVE PROPERTIES COMPANY (MINNESOTA MINING AND MANUFACTURING INNOVATIVE PROPERTIES COMPANY) US 6,490
- DOW GLOBAL TECHNOLOGIES US 6,324
- FUJIFILM JP 5,832
- MERCK PATENT DE 5,481
- BASF (BADISCHE ANILIN & SODA FABRIK) DE 5,147
- SAMSUNG DISPLAY KR 5,105
- NITTO DENKO CORPORATION 3,584