C09J 133/12 Homopolymers or copolymers of methyl methacrylate
Introduced: January 1990
Full Title
Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers > Homopolymers or copolymers of esters > of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical > Homopolymers or copolymers of methacrylic acid esters > Homopolymers or copolymers of methyl methacrylate
No child classifications to compare. This is a leaf node in both IPC and CPC.
Top Applicants
Top Applicants (IPC)
Class C09,2013–2023, worldwide · Source: EPO PATSTAT
- LG CHEM KR 6,420
- NITTO DENKO CORPORATION JP 5,752
- HALLIBURTON ENERGY SERVICES GROUP US 5,650
- 3M INNOVATIVE PROPERTIES COMPANY (MINNESOTA MINING AND MANUFACTURING INNOVATIVE PROPERTIES COMPANY) US 5,635
- DOW GLOBAL TECHNOLOGIES US 4,844
- MERCK PATENT DE 4,779
- CHINESE ACADEMY OF SCIENCES 4,311
- FUJIFILM JP 4,205
- BASF (BADISCHE ANILIN & SODA FABRIK) DE 4,039
- SINOPEC (CHINA PETROCHEMICAL CORPORATION) 3,931
Top Applicants (CPC)
Class C09,2013–2023, worldwide · Source: EPO PATSTAT
- LG CHEM KR 7,954
- HALLIBURTON ENERGY SERVICES GROUP US 6,584
- NITTO DENKO CORPORATION JP 6,500
- 3M INNOVATIVE PROPERTIES COMPANY (MINNESOTA MINING AND MANUFACTURING INNOVATIVE PROPERTIES COMPANY) US 6,490
- DOW GLOBAL TECHNOLOGIES US 6,324
- FUJIFILM JP 5,832
- MERCK PATENT DE 5,481
- BASF (BADISCHE ANILIN & SODA FABRIK) DE 5,147
- SAMSUNG DISPLAY KR 5,105
- NITTO DENKO CORPORATION 3,584