C09J 145/00 Adhesives based on homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic system; Adhesives based on derivatives of such polymers (based on polymers of cyclic esters of polyfunctional acids C09J131/00; based on polymers of cyclic anhydrides or imides C09J135/00)
Introduced: January 1990
Title
Titles differ between systems:
IPC: Adhesives based on homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Adhesives based on derivatives of such polymers
CPC: Adhesives based on homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic system; Adhesives based on derivatives of such polymers (based on polymers of cyclic esters of polyfunctional acids C09J131/00; based on polymers of cyclic anhydrides or imides C09J135/00)
Full Title
Full titles differ between systems:
Adhesives based on homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Adhesives based on derivatives of such polymers
Adhesives based on homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic system; Adhesives based on derivatives of such polymers (based on polymers of cyclic esters of polyfunctional acids C09J131/00; based on polymers of cyclic anhydrides or imides C09J135/00)
IPC and CPC are identically structured here. All 1 subcodes exist in both systems.
IPC defines codes here since 1990.
Child Classifications
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Top Applicants
Top Applicants (IPC)
Class C09,2013–2023, worldwide · Source: EPO PATSTAT
- LG CHEM KR 6,420
- NITTO DENKO CORPORATION JP 5,752
- HALLIBURTON ENERGY SERVICES GROUP US 5,650
- 3M INNOVATIVE PROPERTIES COMPANY (MINNESOTA MINING AND MANUFACTURING INNOVATIVE PROPERTIES COMPANY) US 5,635
- DOW GLOBAL TECHNOLOGIES US 4,844
- MERCK PATENT DE 4,779
- CHINESE ACADEMY OF SCIENCES 4,311
- FUJIFILM JP 4,205
- BASF (BADISCHE ANILIN & SODA FABRIK) DE 4,039
- SINOPEC (CHINA PETROCHEMICAL CORPORATION) 3,931
Top Applicants (CPC)
Class C09,2013–2023, worldwide · Source: EPO PATSTAT
- LG CHEM KR 7,954
- HALLIBURTON ENERGY SERVICES GROUP US 6,584
- NITTO DENKO CORPORATION JP 6,500
- 3M INNOVATIVE PROPERTIES COMPANY (MINNESOTA MINING AND MANUFACTURING INNOVATIVE PROPERTIES COMPANY) US 6,490
- DOW GLOBAL TECHNOLOGIES US 6,324
- FUJIFILM JP 5,832
- MERCK PATENT DE 5,481
- BASF (BADISCHE ANILIN & SODA FABRIK) DE 5,147
- SAMSUNG DISPLAY KR 5,105
- NITTO DENKO CORPORATION 3,584