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DIFF Subgroup
C09K 8/52

Compositions for preventing, limiting or eliminating depositions, e.g. for cleaning

Introduced: January 2006

Full Title

Compositions for drilling of boreholes or wells; Compositions for treating boreholes or wells, e.g. for completion or for remedial operations > Compositions for preventing, limiting or eliminating depositions, e.g. for cleaning

IPC and CPC are identically structured here. All 3 subcodes exist in both systems.

IPC defines codes here since 2006.

Child Classifications

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  • C09K 8/524 organic depositions, e.g. paraffins or asphaltenes since 2006 IPC+CPC Available in IPC and CPC
  • C09K 8/536 characterised by their form or by the form of their components, e.g. encapsulated material since 2006 IPC+CPC Available in IPC and CPC

Top Applicants

Top Applicants (IPC)

Class C09,2013–2023, worldwide · Source: EPO PATSTAT

  1. LG CHEM KR 6,420
  2. NITTO DENKO CORPORATION JP 5,752
  3. HALLIBURTON ENERGY SERVICES GROUP US 5,650
  4. 3M INNOVATIVE PROPERTIES COMPANY (MINNESOTA MINING AND MANUFACTURING INNOVATIVE PROPERTIES COMPANY) US 5,635
  5. DOW GLOBAL TECHNOLOGIES US 4,844
  6. MERCK PATENT DE 4,779
  7. CHINESE ACADEMY OF SCIENCES 4,311
  8. FUJIFILM JP 4,205
  9. BASF (BADISCHE ANILIN & SODA FABRIK) DE 4,039
  10. SINOPEC (CHINA PETROCHEMICAL CORPORATION) 3,931

Top Applicants (CPC)

Class C09,2013–2023, worldwide · Source: EPO PATSTAT

  1. LG CHEM KR 7,954
  2. HALLIBURTON ENERGY SERVICES GROUP US 6,584
  3. NITTO DENKO CORPORATION JP 6,500
  4. 3M INNOVATIVE PROPERTIES COMPANY (MINNESOTA MINING AND MANUFACTURING INNOVATIVE PROPERTIES COMPANY) US 6,490
  5. DOW GLOBAL TECHNOLOGIES US 6,324
  6. FUJIFILM JP 5,832
  7. MERCK PATENT DE 5,481
  8. BASF (BADISCHE ANILIN & SODA FABRIK) DE 5,147
  9. SAMSUNG DISPLAY KR 5,105
  10. NITTO DENKO CORPORATION 3,584