DIFF Subgroup
C25F 3/30 of semiconducting materials
Introduced: July 1974
Full Title
Electrolytic etching or polishing > Polishing > of semiconducting materials
No child classifications to compare. This is a leaf node in both IPC and CPC.
C25F 3/30 Introduced: July 1974
Electrolytic etching or polishing > Polishing > of semiconducting materials
No child classifications to compare. This is a leaf node in both IPC and CPC.