Skip to content
PCE
Search Classifications
Search for IPC and CPC classification codes or keywords
DIFF Subgroup
D21H 23/76

characterised by choice of auxiliary compounds which are added separately from at least one other compound, e.g. to improve the incorporation of the latter or to obtain an enhanced combined effect (D21H17/18, D21H17/70, D21H23/10 take precedence)

Introduced: January 1990

Title

Titles differ between systems:

IPC: characterised by choice of auxiliary compounds which are added separately from at least one other compound, e.g. to improve the incorporation of the latter or to obtain an enhanced combined effect

CPC: characterised by choice of auxiliary compounds which are added separately from at least one other compound, e.g. to improve the incorporation of the latter or to obtain an enhanced combined effect (D21H17/18, D21H17/70, D21H23/10 take precedence)

Full Title

Full titles differ between systems:

IPC:

Processes or apparatus for adding material to the pulp or to the paper > characterised by choice of auxiliary compounds which are added separately from at least one other compound, e.g. to improve the incorporation of the latter or to obtain an enhanced combined effect

CPC:

Processes or apparatus for adding material to the pulp or to the paper (applying liquids or other fluent material to surfaces, in general B05; processes for making continuous lengths of paper D21F11/00) > characterised by choice of auxiliary compounds which are added separately from at least one other compound, e.g. to improve the incorporation of the latter or to obtain an enhanced combined effect (D21H17/18, D21H17/70, D21H23/10 take precedence)

Of 1 combined children, 0 exist in both systems.

1 codes are CPC-only extensions.

Child Classifications

Navigate with arrow keys, Enter to open

Top Applicants

Top Applicants (IPC)

Class D21,2013–2023, worldwide · Source: EPO PATSTAT

  1. VOITH PATENT DE 1,809
  2. STORA ENSO FI 1,467
  3. KEMIRA FI 1,086
  4. KIMBERLY-CLARK CORPORATION US 935
  5. VALMET TECHNOLOGIES FI 924
  6. VALMET SE 904
  7. P&G (PROCTER & GAMBLE COMPANY) US 862
  8. OJI HOLDINGS CORPORATION 696
  9. OMYA INTERNATIONAL CH 584
  10. SOUTH CHINA UNIVERSITY OF TECHNOLOGY 571

Top Applicants (CPC)

Class D21,2013–2023, worldwide · Source: EPO PATSTAT

  1. VOITH PATENT DE 1,857
  2. STORA ENSO FI 1,552
  3. KEMIRA FI 1,173
  4. KIMBERLY-CLARK CORPORATION US 1,107
  5. VALMET TECHNOLOGIES FI 965
  6. VALMET SE 943
  7. P&G (PROCTER & GAMBLE COMPANY) US 941
  8. OMYA INTERNATIONAL CH 821
  9. UPM-KYMMENE CORPORATION FI 512
  10. SEIKO EPSON CORPORATION JP 501