DIFF Subgroup
H10P 14/42 using a gas or vapour
Introduced: January 2026
Full Title
Formation of materials, e.g. in the shape of layers or pillars > of conductive or resistive materials > using a gas or vapour
IPC and CPC are identically structured here. All 2 subcodes exist in both systems.
IPC defines codes here since 2026.
Child Classifications
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- H10P 14/43 Chemical deposition, e.g. chemical vapour deposition [CVD] since 2026 +1 CPC IPC+CPC Available in IPC and CPC