CPC Subgroup
C09B 62/44 with the reactive group not directly attached to a heterocyclic ring
Full Title
Reactive dyes, i.e. dyes which form covalent bonds with the substrates or which polymerise with themselves > with the reactive group not directly attached to a heterocyclic ring
10 direct subcodes
Child Classifications
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- C09B 62/443 the reactive group being alternatively specified
- C09B 62/465 the reactive group being an acryloyl group, a quaternised or non-quaternised aminoalkyl carbonyl group or a (—N)n—CO—A—O—X or (—N)n—CO—A—Hal group, wherein A is an alkylene or alkylidene group, X is hydrogen or an acyl radical of an organic or inorganic acid, Hal is a halogen atom, and n is 0 or 1
- C09B 62/485 the reactive group being a halo-cyclobutyl-carbonyl, halo-cyclobutyl-vinyl-carbonyl, or halo-cyclobutenyl-carbonyl group
- C09B 62/503 the reactive group being an esterified or non-esterified hydroxyalkyl sulfonyl or mercaptoalkyl sulfonyl group, a quaternised or non-quaternised aminoalkyl sulfonyl group, a heterylmercapto alkyl sulfonyl group, a vinyl sulfonyl or a substituted vinyl sulfonyl group, or a thiophene-dioxide group
- C09B 62/523 the reactive group being an esterified or non-esterified hydroxyalkyl sulfonyl amido or hydroxyalkyl amino sulfonyl group, a quaternised or non-quaternised amino alkyl sulfonyl amido group, or a substituted alkyl amino sulfonyl group, or a halogen alkyl sulfonyl amido or halogen alkyl amino sulfonyl group or a vinyl sulfonylamido or a substituted vinyl sulfonamido group
- C09B 62/54 the reactive group being an epoxy or halohydrin group
- C09B 62/62 the reactive group being an ethylenamino or N-acylated ethylenamino group or a —CO—NH—CH2—CH2—X group, wherein X is a halogen atom, a quaternary ammonium group or O-acyl and acyl is derived from an organic or inorganic acid, or a beta-substituted ethylamine group
- C09B 62/763 the reactive group being a N-methylol group or an O-derivative thereof
- C09B 62/78 with other reactive groups
Top Applicants
Top 10 applicants by patent filingsfor class C09, 2013–2023, worldwide · Source: EPO PATSTAT
- LG CHEM KR 7,954
- HALLIBURTON ENERGY SERVICES GROUP US 6,584
- NITTO DENKO CORPORATION JP 6,500
- 3M INNOVATIVE PROPERTIES COMPANY (MINNESOTA MINING AND MANUFACTURING INNOVATIVE PROPERTIES COMPANY) US 6,490
- DOW GLOBAL TECHNOLOGIES US 6,324
- FUJIFILM JP 5,832
- MERCK PATENT DE 5,481
- BASF (BADISCHE ANILIN & SODA FABRIK) DE 5,147
- SAMSUNG DISPLAY KR 5,105
- NITTO DENKO CORPORATION 3,584