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PCE
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CPC Subgroup
G03F 1/28

with three or more diverse phases on the same PSM; Preparation thereof

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Phase shift masks [PSM]; PSM blanks; Preparation thereof > with three or more diverse phases on the same PSM; Preparation thereof