CPC Subgroup
G03F 1/28 with three or more diverse phases on the same PSM; Preparation thereof
Full Title
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Phase shift masks [PSM]; PSM blanks; Preparation thereof > with three or more diverse phases on the same PSM; Preparation thereof