Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Child Classifications

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• G03F 1/20 Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
• G03F 1/22 Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
• G03F 1/26 Phase shift masks [PSM]; PSM blanks; Preparation thereof
• G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• G03F 1/38 Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
• G03F 1/50 Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
• G03F 1/52 Reflectors
• G03F 1/54 Absorbers, e.g. of opaque materials
• G03F 1/60 Substrates
• G03F 1/62 Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
• G03F 1/66 Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
• G03F 1/68 Preparation processes not covered by groups G03F1/20 - G03F1/50
• G03F 1/88 prepared by photographic processes for production of originals simulating relief
• G03F 1/90 prepared by montage processes
• G03F 1/92 prepared from printing surfaces