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CPC Subclass Not Allocatable
G03F

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

Description

G03F encompasses photomechanical and photolithographic processes for creating textured or patterned surfaces on substrates, with primary applications in printing plate production and semiconductor device manufacturing. The classification covers photoresists and light-sensitive materials, exposure techniques, development processes, and specialized apparatus used in pattern transfer. It includes origination materials (photographic originals, masks, and reticles) and substrates for pattern creation. Adjacent classes exclude general photographic processes (G03C), electrography (G03G), and the subsequent etching or ion-beam processing steps that follow pattern definition.

5 direct subcodes

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