PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

Description

G03F encompasses photomechanical and photolithographic processes for creating textured or patterned surfaces on substrates, with primary applications in printing plate production and semiconductor device manufacturing. The classification covers photoresists and light-sensitive materials, exposure techniques, development processes, and specialized apparatus used in pattern transfer. It includes origination materials (photographic originals, masks, and reticles) and substrates for pattern creation. Adjacent classes exclude general photographic processes (G03C), electrography (G03G), and the subsequent etching or ion-beam processing steps that follow pattern definition.

Filing statistics

CPC subclass G03F recorded 143,777 patent applications worldwide between 2013 and 2023. Annual filings grew from 11,180 in 2013 to 13,758 in 2023 (+23%), peaking at 14,459 applications in 2021. The most active applicants in class G03 are CANON (19,215 applications), CANON (12,916 applications) and ASML NETHERLANDS (10,000 applications).

Source: EPO PATSTAT, worldwide filings