Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Phase shift masks [PSM]; PSM blanks; Preparation thereof > Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof