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CPC Subgroup
G06F 30/398

Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM] (optical proximity correction [OPC] design processes G03F1/36)

Full Title

Computer-aided design [CAD] > Circuit design > Circuit design at the physical level (physical level design for reconfigurable circuits G06F30/347) > Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM] (optical proximity correction [OPC] design processes G03F1/36)

Top Applicants

Top 10 applicants by patent filingsfor class G06, 2013–2023, worldwide · Source: EPO PATSTAT

  1. SAMSUNG ELECTRONICS COMPANY KR 76,952
  2. IBM (INTERNATIONAL BUSINESS MACHINES CORPORATION) US 62,841
  3. MICROSOFT TECHNOLOGY LICENSING US 44,778
  4. GOOGLE US 35,735
  5. INTEL CORPORATION US 32,087
  6. HUAWEI TECHNOLOGIES COMPANY CN 30,572
  7. TENCENT TECHNOLOGY (SHENZHEN) COMPANY 25,023
  8. APPLE US 23,482
  9. SGCC(STATE GRID CORPORATION OF CHINA) 22,548
  10. HUAWEI TECHNOLOGIES COMPANY 20,917