CPC Subgroup
H10P 30/20 into semiconductor materials, e.g. for doping
Full Title
Ion implantation into wafers, substrates or parts of devices > into semiconductor materials, e.g. for doping
11 direct subcodes
Child Classifications
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- H10P 30/22 using masks
- H10P 30/28 characterised by an annealing step, e.g. for activation of dopants