CPC Subgroup
H10P 52/207 Full Title
Grinding, lapping or polishing of wafers, substrates or parts of devices > Electromechanical polishing [EMP]; Electrochemical mechanical polishing [ECMP]
H10P 52/207 Grinding, lapping or polishing of wafers, substrates or parts of devices > Electromechanical polishing [EMP]; Electrochemical mechanical polishing [ECMP]