C23C 16/01 on temporary substrates, e.g. substrates subsequently removed by etching
Introduced: January 2000
Title
Titles differ between systems:
IPC: on temporary substrates, e.g. on substrates subsequently removed by etching
CPC: on temporary substrates, e.g. substrates subsequently removed by etching
Full Title
Full titles differ between systems:
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes > on temporary substrates, e.g. on substrates subsequently removed by etching
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00) > on temporary substrates, e.g. substrates subsequently removed by etching
No child classifications to compare. This is a leaf node in both IPC and CPC.