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PCE
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DIFF Subgroup
C23C 16/01

on temporary substrates, e.g. substrates subsequently removed by etching

Introduced: January 2000

Title

Titles differ between systems:

IPC: on temporary substrates, e.g. on substrates subsequently removed by etching

CPC: on temporary substrates, e.g. substrates subsequently removed by etching

Full Title

Full titles differ between systems:

IPC:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes > on temporary substrates, e.g. on substrates subsequently removed by etching

CPC:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00) > on temporary substrates, e.g. substrates subsequently removed by etching

No child classifications to compare. This is a leaf node in both IPC and CPC.