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DIFF Main Group
C23C 16/00

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00)

Introduced: January 1985

Title

Titles differ between systems:

IPC: Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes

CPC: Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00)

Full Title

Full titles differ between systems:

IPC:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes

CPC:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00)

Of 9 combined children, 7 exist in both systems.

2 codes are CPC-only extensions.

3 shared codes have differing titles between IPC and CPC.

IPC defines codes here since 1985.

Child Classifications

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  • C23C 16/003 CPC only CPC only
  • C23C 16/006 CPC only CPC only
  • C23C 16/01 on temporary substrates, e.g. substrates subsequently removed by etching since 2000 IPC+CPC Available in IPC and CPC
  • C23C 16/56 After-treatment since 1985 IPC+CPC Available in IPC and CPC