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DIFF Subgroup
C23C 16/20

Deposition of aluminium only

Introduced: January 1985

Full Title

Full titles differ between systems:

IPC:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes > characterised by the deposition of metallic material > from metallo-organic compounds > Deposition of aluminium only

CPC:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00) > characterised by the deposition of metallic material > from metallo-organic compounds > Deposition of aluminium only

No child classifications to compare. This is a leaf node in both IPC and CPC.