by activating reactive gas streams before introduction into the reaction chamber, e.g. by or addition of reactive species

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes > characterised by the method of coating > characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials > by activating reactive gas streams before introduction into the reaction chamber, e.g. by ionization or by addition of reactive species

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00) > characterised by the method of coating (C23C16/04 takes precedence) > characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials > by activating reactive gas streams before introduction into the reaction chamber, e.g. by or addition of reactive species