C23C 16/455 characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
Introduced: January 2000
Title
Titles differ between systems:
IPC: characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
CPC: characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
Full Title
Full titles differ between systems:
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes > characterised by the method of coating > characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00) > characterised by the method of coating (C23C16/04 takes precedence) > characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
Of 16 combined children, 0 exist in both systems.
16 codes are CPC-only extensions.
Child Classifications
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