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DIFF Subgroup
H03F 1/08

Modifications of amplifiers to reduce detrimental influences of internal impedances of amplifying elements (wide-band amplifiers with inter-stage coupling networks incorporating these impedances H03F1/42)

Introduced: September 1968

Title

Titles differ between systems:

IPC: Modifications of amplifiers to reduce detrimental influences of internal impedances of amplifying elements

CPC: Modifications of amplifiers to reduce detrimental influences of internal impedances of amplifying elements (wide-band amplifiers with inter-stage coupling networks incorporating these impedances H03F1/42)

Full Title

Full titles differ between systems:

IPC:

Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements > Modifications of amplifiers to reduce detrimental influences of internal impedances of amplifying elements

CPC:

Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements > Modifications of amplifiers to reduce detrimental influences of internal impedances of amplifying elements (wide-band amplifiers with inter-stage coupling networks incorporating these impedances H03F1/42)

Additional Content IPC

Wide-band amplifiers with inter-stage coupling networks incorporating these impedances

Of 6 combined children, 5 exist in both systems.

1 codes are CPC-only extensions.

Child Classifications

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  • H03F 1/10 by use of amplifying elements with multiple electrode connections IPC+CPC Available in IPC and CPC

Top Applicants

Top Applicants (IPC)

Class H03,2013–2023, worldwide · Source: EPO PATSTAT

  1. QUALCOMM US 5,625
  2. SAMSUNG ELECTRONICS COMPANY KR 5,496
  3. MURATA MANUFACTURING COMPANY JP 5,478
  4. HUAWEI TECHNOLOGIES COMPANY CN 3,383
  5. INTEL CORPORATION US 3,091
  6. TEXAS INSTRUMENTS US 3,070
  7. MURATA MANUFACTURING COMPANY 2,722
  8. SKYWORKS SOLUTIONS US 2,290
  9. SEIKO EPSON CORPORATION 2,177
  10. IBM (INTERNATIONAL BUSINESS MACHINES CORPORATION) US 2,158

Top Applicants (CPC)

Class H03,2013–2023, worldwide · Source: EPO PATSTAT

  1. SAMSUNG ELECTRONICS COMPANY KR 7,293
  2. QUALCOMM US 7,085
  3. MURATA MANUFACTURING COMPANY JP 5,982
  4. HUAWEI TECHNOLOGIES COMPANY CN 4,641
  5. INTEL CORPORATION US 3,863
  6. TEXAS INSTRUMENTS US 3,409
  7. MURATA MANUFACTURING COMPANY 2,874
  8. SK HYNIX KR 2,644
  9. SKYWORKS SOLUTIONS US 2,545
  10. IBM (INTERNATIONAL BUSINESS MACHINES CORPORATION) US 2,437