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IPC Subgroup
C25F 3/02

Etching

Introduced: July 1974

Last revised: January 2006

Full Title

Electrolytic etching or polishing > Etching

Classification Context

Section:
CHEMISTRY; METALLURGY
Class:
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
Subclass:
PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR

Filing statistics

IPC C25F 3/02 belongs to the parent subclass C25F, which recorded 7,941 patent applications worldwide between 2013 and 2023. Annual filings grew from 515 in 2013 to 911 in 2023 (+77%). The most active applicants in class C25 are CHINESE ACADEMY OF SCIENCES (1,797 applications), EBARA CORPORATION (729 applications) and CENTRAL SOUTH UNIVERSITY (650 applications).

Source: EPO PATSTAT, worldwide filings

Related Keywords

etching metals by ELECTROLYSISETCHING of metals by electrolysis

6 direct subcodes

Child Classifications

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Top Applicants

Top 10 applicants by patent filingsfor class C25, 2013–2023, worldwide · Source: EPO PATSTAT

  1. CHINESE ACADEMY OF SCIENCES 1,797
  2. EBARA CORPORATION JP 729
  3. CENTRAL SOUTH UNIVERSITY 650
  4. INDUSTRIE DE NORA IT 641
  5. ROBERT BOSCH DE 600
  6. JFE STEEL JP 593
  7. KMUST (KUNMING UNIVERSITY OF SCIENCE AND TECHNOLOGY) 553
  8. SIEMENS DE 536
  9. CEA (COMMISSARIAT A L'ENERGIE ATOMIQUE) FR 525
  10. JX NIPPON MINING & METALS CORPORATION 499