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CPC Subgroup
G03F 7/7035

Full Title

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K)

Top Applicants

Top 10 applicants by patent filingsfor class G03, 2013–2023, worldwide · Source: EPO PATSTAT

  1. CANON JP 19,215
  2. CANON 12,916
  3. ASML NETHERLANDS NL 10,000
  4. FUJIFILM JP 7,814
  5. SAMSUNG ELECTRONICS COMPANY KR 5,181
  6. CARL ZEISS SMT DE 5,079
  7. RICOH COMPANY JP 4,343
  8. LG INNOTEK COMPANY KR 4,054
  9. KYOCERA DOCUMENT SOLUTIONS 3,812
  10. KYOCERA DOCUMENT SOLUTIONS JP 3,682