CPC Main Group
G03F 7/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K)
15 direct subcodes
Child Classifications
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- G03F 7/004 Photosensitive materials (G03F7/12, G03F7/14 take precedence)
- G03F 7/12 Production of screen printing forms or similar printing forms, e.g. stencils
- G03F 7/14 Production of collotype printing forms
- G03F 7/16 Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74)
- G03F 7/20 Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00)
- G03F 7/26 Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence)