DIFF Subgroup
G03F 7/0012 Full Title
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K)
Top Applicants
Top Applicants (IPC)
Class G03,2013–2023, worldwide · Source: EPO PATSTAT
- CANON 31,416
- CANON JP 17,469
- KYOCERA DOCUMENT SOLUTIONS 9,845
- RICOH COMPANY 9,807
- ASML NETHERLANDS NL 9,427
- FUJIFILM JP 7,225
- KONICA MINOLTA CORPORATION 7,216
- FUJI XEROX COMPANY 5,711
- CARL ZEISS SMT DE 4,971
- RICOH COMPANY JP 4,123
Top Applicants (CPC)
Class G03,2013–2023, worldwide · Source: EPO PATSTAT
- CANON JP 19,215
- CANON 12,916
- ASML NETHERLANDS NL 10,000
- FUJIFILM JP 7,814
- SAMSUNG ELECTRONICS COMPANY KR 5,181
- CARL ZEISS SMT DE 5,079
- RICOH COMPANY JP 4,343
- LG INNOTEK COMPANY KR 4,054
- KYOCERA DOCUMENT SOLUTIONS 3,812
- KYOCERA DOCUMENT SOLUTIONS JP 3,682