G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
Introduced: September 1968
Description
G03F encompasses photomechanical and photolithographic processes for creating textured or patterned surfaces on substrates, with primary applications in printing plate production and semiconductor device manufacturing. The classification covers photoresists and light-sensitive materials, exposure techniques, development processes, and specialized apparatus used in pattern transfer. It includes origination materials (photographic originals, masks, and reticles) and substrates for pattern creation. Adjacent classes exclude general photographic processes (G03C), electrography (G03G), and the subsequent etching or ion-beam processing steps that follow pattern definition.
Title
Titles differ between systems:
IPC: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
CPC: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
Full Title
Full titles differ between systems:
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
IPC and CPC are identically structured here. All 5 subcodes exist in both systems.
4 shared codes have differing titles between IPC and CPC.
Child Classifications
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- G03F 1/00 Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof IPC+CPC Available in IPC and CPC
- G03F 3/00 Colour separation; Correction of tonal value (photographic copying apparatus in general G03B) −1 IPC IPC+CPC Available in IPC and CPC
- G03F 7/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) +9 CPC IPC+CPC Available in IPC and CPC
- G03F 9/00 Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F7/22 takes precedence; preparation of photographic masks G03F1/00; within photographic printing apparatus for making copies G03B27/00) +2 CPC −1 IPC IPC+CPC Available in IPC and CPC
Top Applicants
Top Applicants (IPC)
Class G03,2013–2023, worldwide · Source: EPO PATSTAT
- CANON 31,416
- CANON JP 17,469
- KYOCERA DOCUMENT SOLUTIONS 9,845
- RICOH COMPANY 9,807
- ASML NETHERLANDS NL 9,427
- FUJIFILM JP 7,225
- KONICA MINOLTA CORPORATION 7,216
- FUJI XEROX COMPANY 5,711
- CARL ZEISS SMT DE 4,971
- RICOH COMPANY JP 4,123
Top Applicants (CPC)
Class G03,2013–2023, worldwide · Source: EPO PATSTAT
- CANON JP 19,215
- CANON 12,916
- ASML NETHERLANDS NL 10,000
- FUJIFILM JP 7,814
- SAMSUNG ELECTRONICS COMPANY KR 5,181
- CARL ZEISS SMT DE 5,079
- RICOH COMPANY JP 4,343
- LG INNOTEK COMPANY KR 4,054
- KYOCERA DOCUMENT SOLUTIONS 3,812
- KYOCERA DOCUMENT SOLUTIONS JP 3,682