Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K)

Child Classifications

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• G03F 7/0002 CPC only CPC only
• G03F 7/0005 +2 CPC CPC only CPC only
• G03F 7/0012 CPC only CPC only
• G03F 7/0015 CPC only CPC only
• G03F 7/0017 CPC only CPC only
• G03F 7/002 +1 CPC CPC only CPC only
• G03F 7/0035 CPC only CPC only
• G03F 7/0037 CPC only CPC only
• G03F 7/004 Photosensitive materials (G03F7/12, G03F7/14 take precedence) since 1990 +6 CPC IPC+CPC Available in IPC and CPC
• G03F 7/12 Production of screen printing forms or similar printing forms, e.g. stencils IPC+CPC Available in IPC and CPC
• G03F 7/14 Production of collotype printing forms IPC+CPC Available in IPC and CPC
• G03F 7/16 Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74) +6 CPC IPC+CPC Available in IPC and CPC
• G03F 7/20 Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) +8 CPC −1 IPC IPC+CPC Available in IPC and CPC
• G03F 7/26 Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence) since 1980 +1 CPC IPC+CPC Available in IPC and CPC
• G03F 7/70 +11 CPC CPC only CPC only