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PCE
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DIFF Subgroup
G03F 7/24

Curved surfaces

Introduced: September 1968

Full Title

Full titles differ between systems:

IPC:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Exposure; Apparatus therefor > Curved surfaces

CPC:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) > Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) > Curved surfaces

No child classifications to compare. This is a leaf node in both IPC and CPC.