Exposing sequentially with the same light pattern different positions of the same surface

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Exposure; Apparatus therefor > Exposing sequentially with the same light pattern different positions of the same surface

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) > Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) > Exposing sequentially with the same light pattern different positions of the same surface