Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Processing photosensitive materials; Apparatus therefor > Imagewise removal not covered by groups , e.g. using gas streams, using plasma

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) > Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence) > Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma