G11B 11/105 using a beam of light or a magnetic field for recording and a beam of light for reproducing, e.g. light-induced thermomagnetic recording, Kerr effect reproducing
Introduced: January 2000
Title
Titles differ between systems:
IPC: using a beam of light or a magnetic field for recording and a beam of light for reproducing, e.g. light-induced thermomagnetic recording or Kerr effect reproducing
CPC: using a beam of light or a magnetic field for recording and a beam of light for reproducing, e.g. light-induced thermomagnetic recording, Kerr effect reproducing
Full Title
Full titles differ between systems:
Recording on, or reproducing from, the same record carrier wherein for these two operations the methods or means are covered by different main groups of groups or by different subgroups of group; Record carriers therefor > using recording by magnetisation or demagnetisation > using a beam of light or a magnetic field for recording and a beam of light for reproducing, e.g. light-induced thermomagnetic recording or Kerr effect reproducing
Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor > using recording by magnetic means > using a beam of light or a magnetic field for recording and a beam of light for reproducing, e.g. light-induced thermomagnetic recording, Kerr effect reproducing
Of 5 combined children, 0 exist in both systems.
5 codes are CPC-only extensions.
Child Classifications
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Top Applicants
Top Applicants (IPC)
Class G11,2013–2023, worldwide · Source: EPO PATSTAT
- MICRON TECHNOLOGY US 10,574
- SK HYNIX KR 9,138
- SAMSUNG ELECTRONICS COMPANY KR 9,004
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY TW 3,739
- IBM (INTERNATIONAL BUSINESS MACHINES CORPORATION) US 3,443
- INTEL CORPORATION US 2,952
- SANDISK TECHNOLOGIES US 2,905
- WESTERN DIGITAL TECHNOLOGIES US 2,630
- TOSHIBA CORPORATION JP 2,593
- SEAGATE TECHNOLOGY US 2,472
Top Applicants (CPC)
Class G11,2013–2023, worldwide · Source: EPO PATSTAT
- MICRON TECHNOLOGY US 12,397
- SAMSUNG ELECTRONICS COMPANY KR 12,238
- SK HYNIX KR 11,371
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY TW 4,601
- INTEL CORPORATION US 3,874
- IBM (INTERNATIONAL BUSINESS MACHINES CORPORATION) US 3,866
- SANDISK TECHNOLOGIES US 3,151
- SK HYNIX 3,143
- SAMSUNG ELECTRONICS COMPANY 3,073
- WESTERN DIGITAL TECHNOLOGIES US 2,961