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DIFF Subgroup
G11B 11/105

using a beam of light or a magnetic field for recording and a beam of light for reproducing, e.g. light-induced thermomagnetic recording, Kerr effect reproducing

Introduced: January 2000

Title

Titles differ between systems:

IPC: using a beam of light or a magnetic field for recording and a beam of light for reproducing, e.g. light-induced thermomagnetic recording or Kerr effect reproducing

CPC: using a beam of light or a magnetic field for recording and a beam of light for reproducing, e.g. light-induced thermomagnetic recording, Kerr effect reproducing

Full Title

Full titles differ between systems:

IPC:

Recording on, or reproducing from, the same record carrier wherein for these two operations the methods or means are covered by different main groups of groups or by different subgroups of group; Record carriers therefor > using recording by magnetisation or demagnetisation > using a beam of light or a magnetic field for recording and a beam of light for reproducing, e.g. light-induced thermomagnetic recording or Kerr effect reproducing

CPC:

Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor > using recording by magnetic means > using a beam of light or a magnetic field for recording and a beam of light for reproducing, e.g. light-induced thermomagnetic recording, Kerr effect reproducing

Of 5 combined children, 0 exist in both systems.

5 codes are CPC-only extensions.

Child Classifications

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Top Applicants

Top Applicants (IPC)

Class G11,2013–2023, worldwide · Source: EPO PATSTAT

  1. MICRON TECHNOLOGY US 10,574
  2. SK HYNIX KR 9,138
  3. SAMSUNG ELECTRONICS COMPANY KR 9,004
  4. TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY TW 3,739
  5. IBM (INTERNATIONAL BUSINESS MACHINES CORPORATION) US 3,443
  6. INTEL CORPORATION US 2,952
  7. SANDISK TECHNOLOGIES US 2,905
  8. WESTERN DIGITAL TECHNOLOGIES US 2,630
  9. TOSHIBA CORPORATION JP 2,593
  10. SEAGATE TECHNOLOGY US 2,472

Top Applicants (CPC)

Class G11,2013–2023, worldwide · Source: EPO PATSTAT

  1. MICRON TECHNOLOGY US 12,397
  2. SAMSUNG ELECTRONICS COMPANY KR 12,238
  3. SK HYNIX KR 11,371
  4. TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY TW 4,601
  5. INTEL CORPORATION US 3,874
  6. IBM (INTERNATIONAL BUSINESS MACHINES CORPORATION) US 3,866
  7. SANDISK TECHNOLOGIES US 3,151
  8. SK HYNIX 3,143
  9. SAMSUNG ELECTRONICS COMPANY 3,073
  10. WESTERN DIGITAL TECHNOLOGIES US 2,961