Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features (G11B5/265, , G11B5/31 take precedence)

Introduced: January 1985

Title

Titles differ between systems:

IPC: Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to, the recording medium; Pole pieces; Gap features

CPC: Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features (G11B5/265, , G11B5/31 take precedence)

Full Title

Full titles differ between systems:

IPC:

Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor > Structure or manufacture of heads, e.g. inductive > Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to, the recording medium; Pole pieces; Gap features

CPC:

Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor (G11B11/00 take precedence) > Structure or manufacture of heads, e.g. inductive > Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features (G11B5/265, , G11B5/31 take precedence)

Of 7 combined children, 5 exist in both systems.

2 codes are CPC-only extensions.

1 shared codes have differing titles between IPC and CPC.

IPC defines codes here since 1985.

Child Classifications

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G11B 5/1871 +1 CPC CPC only CPC only
G11B 5/1875 +1 CPC CPC only CPC only
G11B 5/193 the pole pieces being ferrite since 1985 IPC+CPC Available in IPC and CPC
G11B 5/21 the pole pieces being of ferrous sheet metal since 1985 IPC+CPC Available in IPC and CPC
G11B 5/23 Gap features since 1985 +1 CPC IPC+CPC Available in IPC and CPC
G11B 5/245 comprising means for controlling the reluctance of the magnetic circuit (G11B5/255 takes precedence) since 1985 +1 CPC IPC+CPC Available in IPC and CPC
G11B 5/255 comprising means for protection against wear since 1985 IPC+CPC Available in IPC and CPC

Top Applicants

Top Applicants (IPC)

Class G11,2013–2023, worldwide · Source: EPO PATSTAT

MICRON TECHNOLOGY US 10,574
SK HYNIX KR 9,138
SAMSUNG ELECTRONICS COMPANY KR 9,004
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY TW 3,739
IBM (INTERNATIONAL BUSINESS MACHINES CORPORATION) US 3,443
INTEL CORPORATION US 2,952
SANDISK TECHNOLOGIES US 2,905
WESTERN DIGITAL TECHNOLOGIES US 2,630
TOSHIBA CORPORATION JP 2,593
SEAGATE TECHNOLOGY US 2,472

Top Applicants (CPC)

Class G11,2013–2023, worldwide · Source: EPO PATSTAT

MICRON TECHNOLOGY US 12,397
SAMSUNG ELECTRONICS COMPANY KR 12,238
SK HYNIX KR 11,371
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY TW 4,601
INTEL CORPORATION US 3,874
IBM (INTERNATIONAL BUSINESS MACHINES CORPORATION) US 3,866
SANDISK TECHNOLOGIES US 3,151
SK HYNIX 3,143
SAMSUNG ELECTRONICS COMPANY 3,073
WESTERN DIGITAL TECHNOLOGIES US 2,961