DIFF Main Group
H10P 76/00 Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
Introduced: January 2026
IPC and CPC are identically structured here. All 2 subcodes exist in both systems.
IPC defines codes here since 2026.
Child Classifications
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- H10P 76/40 of masks comprising inorganic materials since 2026 +3 CPC IPC+CPC Available in IPC and CPC