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IPC Subgroup
C01B 33/035

by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process

Introduced: January 1990

Last revised: January 2006

Full Title

Silicon; Compounds thereof > Silicon > Preparation > by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material > by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process

Classification Context

Section:
CHEMISTRY; METALLURGY
Class:
INORGANIC CHEMISTRY
Subclass:
NON-METALLIC ELEMENTS; COMPOUNDS THEREOF

Top Applicants

Top 10 applicants by patent filingsfor class C01, 2013–2023, worldwide · Source: EPO PATSTAT

  1. CHINESE ACADEMY OF SCIENCES 5,794
  2. SINOPEC (CHINA PETROCHEMICAL CORPORATION) 3,286
  3. LG CHEM KR 2,689
  4. BASF (BADISCHE ANILIN & SODA FABRIK) DE 1,669
  5. CENTRAL SOUTH UNIVERSITY 1,531
  6. KMUST (KUNMING UNIVERSITY OF SCIENCE AND TECHNOLOGY) 1,252
  7. SUMITOMO METAL MINING COMPANY JP 1,073
  8. ZHEJIANG UNIVERSITY 1,061
  9. PANASONIC INTELLECTUAL PROPERTY JP 1,058
  10. PANASONIC INTELLECTUAL PROPERTY 1,038