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CPC Subgroup
C01B 33/035

by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process

Full Title

Silicon; Compounds thereof ( C01B21/00, C01B23/00 take precedence; persilicates C01B15/14; carbides C01B32/956) > Silicon (forming single crystals or homogeneous polycrystalline material with defined structure C30B) > Preparation (chemical coating from the vapour phase C23C16/00) > by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material > by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process

Top Applicants

Top 10 applicants by patent filingsfor class C01, 2013–2023, worldwide · Source: EPO PATSTAT

  1. CHINESE ACADEMY OF SCIENCES 4,293
  2. LG CHEM KR 3,317
  3. BASF (BADISCHE ANILIN & SODA FABRIK) DE 2,219
  4. SINOPEC (CHINA PETROCHEMICAL CORPORATION) 2,154
  5. OMYA INTERNATIONAL CH 1,524
  6. PANASONIC INTELLECTUAL PROPERTY JP 1,362
  7. SAUDI ARABIAN OIL COMPANY SA 1,298
  8. SUMITOMO METAL MINING COMPANY JP 1,286
  9. CENTRAL SOUTH UNIVERSITY 1,243
  10. L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE FR 1,238