IPC Subgroup
H10P 30/28 characterised by an annealing step, e.g. for activation of dopants
Introduced: January 2026
Full Title
Ion implantation into wafers, substrates or parts of devices > into semiconductor materials, e.g. for doping > characterised by an annealing step, e.g. for activation of dopants
Classification Context
- Section:
- ELECTRICITY
- Class:
- SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- Subclass:
- GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS