CPC Subgroup Additional Only
B81C 2201/0101 Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
Full Title
Manufacture or treatment of microstructural devices or systems > in or on a substrate > Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
7 direct subcodes
Child Classifications
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- B81C 2201/0102 Surface micromachining
- B81C 2201/0111 Bulk micromachining
- B81C 2201/0118 Processes for the planarization of structures
- B81C 2201/0128 Processes for removing material
- B81C 2201/0147 Film patterning
- B81C 2201/0156 Lithographic techniques
- B81C 2201/016 Passivation
Top Applicants
Top 10 applicants by patent filingsfor class B81, 2013–2023, worldwide · Source: EPO PATSTAT
- ROBERT BOSCH DE 1,976
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY TW 788
- INFINEON TECHNOLOGIES DE 759
- CEA (COMMISSARIAT A L'ENERGIE ATOMIQUE) FR 555
- STMICROELECTRONICS IT 526
- INVENSENSE US 430
- MURATA MANUFACTURING COMPANY JP 418
- SEIKO EPSON CORPORATION 338
- CHINESE ACADEMY OF SCIENCES 338
- FRAUNHOFER DE 297