CPC Subgroup Additional Only
B81C 2203/0707 Monolithic integration, i.e. the electronic processing unit is formed on or in the same substrate as the micromechanical structure
Full Title
Forming microstructural systems > Integrating an electronic processing unit with a micromechanical structure > Monolithic integration, i.e. the electronic processing unit is formed on or in the same substrate as the micromechanical structure
7 direct subcodes
Child Classifications
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- B81C 2203/0714 Forming the micromechanical structure with a CMOS process
- B81C 2203/0721 Forming the micromechanical structure with a low-temperature process (B81C2203/0735 takes precedence)
- B81C 2203/0728 Pre-CMOS, i.e. forming the micromechanical structure before the CMOS circuit
- B81C 2203/0735 Post-CMOS, i.e. forming the micromechanical structure after the CMOS circuit
- B81C 2203/0742 Interleave, i.e. simultaneously forming the micromechanical structure and the CMOS circuit
- B81C 2203/075 the electronic processing unit being integrated into an element of the micromechanical structure
- B81C 2203/0757 Topology for facilitating the monolithic integration
Top Applicants
Top 10 applicants by patent filingsfor class B81, 2013–2023, worldwide · Source: EPO PATSTAT
- ROBERT BOSCH DE 1,976
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY TW 788
- INFINEON TECHNOLOGIES DE 759
- CEA (COMMISSARIAT A L'ENERGIE ATOMIQUE) FR 555
- STMICROELECTRONICS IT 526
- INVENSENSE US 430
- MURATA MANUFACTURING COMPANY JP 418
- SEIKO EPSON CORPORATION 338
- CHINESE ACADEMY OF SCIENCES 338
- FRAUNHOFER DE 297