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CPC Subgroup Additional Only
B81C 2203/0707

Monolithic integration, i.e. the electronic processing unit is formed on or in the same substrate as the micromechanical structure

Full Title

Forming microstructural systems > Integrating an electronic processing unit with a micromechanical structure > Monolithic integration, i.e. the electronic processing unit is formed on or in the same substrate as the micromechanical structure

7 direct subcodes

Child Classifications

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  • B81C 2203/0714 Forming the micromechanical structure with a CMOS process
  • B81C 2203/0721 Forming the micromechanical structure with a low-temperature process (B81C2203/0735 takes precedence)
  • B81C 2203/0728 Pre-CMOS, i.e. forming the micromechanical structure before the CMOS circuit
  • B81C 2203/0735 Post-CMOS, i.e. forming the micromechanical structure after the CMOS circuit
  • B81C 2203/0742 Interleave, i.e. simultaneously forming the micromechanical structure and the CMOS circuit
  • B81C 2203/075 the electronic processing unit being integrated into an element of the micromechanical structure

Top Applicants

Top 10 applicants by patent filingsfor class B81, 2013–2023, worldwide · Source: EPO PATSTAT

  1. ROBERT BOSCH DE 1,976
  2. TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY TW 788
  3. INFINEON TECHNOLOGIES DE 759
  4. CEA (COMMISSARIAT A L'ENERGIE ATOMIQUE) FR 555
  5. STMICROELECTRONICS IT 526
  6. INVENSENSE US 430
  7. MURATA MANUFACTURING COMPANY JP 418
  8. SEIKO EPSON CORPORATION 338
  9. CHINESE ACADEMY OF SCIENCES 338
  10. FRAUNHOFER DE 297