CPC Subgroup
C23C 16/50 using electric discharges
Full Title
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00) > characterised by the method of coating (C23C16/04 takes precedence) > using electric discharges
6 direct subcodes
Child Classifications
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- C23C 16/503 using DC or AC discharges
- C23C 16/505 using radio frequency discharges
- C23C 16/511 using microwave discharges
- C23C 16/513 using plasma jets
- C23C 16/515 using pulsed discharges
- C23C 16/517 using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
Top Applicants
Top 10 applicants by patent filingsfor class C23, 2013–2023, worldwide · Source: EPO PATSTAT
- APPLIED MATERIALS US 10,596
- TOKYO ELECTRON JP 5,229
- LAM RESEARCH CORPORATION US 3,622
- NIPPON STEEL CORPORATION JP 3,171
- JFE STEEL JP 3,128
- ASM IP HOLDING NL 2,722
- ARCELORMITTAL LU 2,481
- TOKYO ELECTRON 2,359
- APPLIED MATERIALS 2,284
- CHINESE ACADEMY OF SCIENCES 2,110