characterised by the method of coating (C23C16/04 takes precedence)

Full Title

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00) > characterised by the method of coating (C23C16/04 takes precedence)

Child Classifications

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• C23C 16/4401
• C23C 16/4411
• C23C 16/4412
• C23C 16/4414
• C23C 16/4415
• C23C 16/4417
• C23C 16/4418
• C23C 16/442 using fluidised bed process
• C23C 16/448 characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
• C23C 16/453 passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD (C23C16/513 takes precedence; for flame or plasma spraying of coating material in the molten state C23C4/00)
• C23C 16/455 characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
• C23C 16/458 characterised by the method used for supporting substrates in the reaction chamber
• C23C 16/46 characterised by the method used for heating the substrate (C23C16/48, C23C16/50 take precedence)
• C23C 16/48 by irradiation, e.g. photolysis, radiolysis, particle radiation
• C23C 16/50 using electric discharges
• C23C 16/52 Controlling or regulating the coating process
• C23C 16/54 Apparatus specially adapted for continuous coating