CPC Main Group
C23C 16/00 Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00)
9 direct subcodes
Child Classifications
Navigate with arrow keys, Enter to open
- C23C 16/01 on temporary substrates, e.g. substrates subsequently removed by etching
- C23C 16/02 Pretreatment of the material to be coated (C23C16/04 takes precedence)
- C23C 16/04 Coating on selected surface areas, e.g. using masks
- C23C 16/06 characterised by the deposition of metallic material
- C23C 16/22 characterised by the deposition of inorganic material, other than metallic material
- C23C 16/44 characterised by the method of coating (C23C16/04 takes precedence)
- C23C 16/56 After-treatment