G01N 23/2251 using incident electron beams, e.g. scanning electron microscopy [SEM]
Full Title
Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 > by measuring secondary emission from the material > using electron or ion > using incident electron beams, e.g. scanning electron microscopy [SEM]
Filing statistics
CPC G01N 23/2251 belongs to the parent subclass G01N, which recorded 1,076,242 patent applications worldwide between 2013 and 2023. Annual filings grew from 58,557 in 2013 to 108,067 in 2023 (+85%), peaking at 123,338 applications in 2020. The most active applicants in class G01 are CHINESE ACADEMY OF SCIENCES (21,460 applications), ROBERT BOSCH (17,801 applications) and SGCC(STATE GRID CORPORATION OF CHINA) (17,347 applications).
Source: EPO PATSTAT, worldwide filings
2 direct subcodes
Child Classifications
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- G01N 23/2252 Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
- G01N 23/2254 Measuring cathodoluminescence
Top Applicants
Top 10 applicants by patent filingsfor class G01, 2013–2023, worldwide · Source: EPO PATSTAT
- CHINESE ACADEMY OF SCIENCES 21,460
- ROBERT BOSCH DE 17,801
- SGCC(STATE GRID CORPORATION OF CHINA) 17,347
- SAMSUNG ELECTRONICS COMPANY KR 13,192
- QUALCOMM US 9,900
- HALLIBURTON ENERGY SERVICES GROUP US 9,742
- PHILIPS ELECTRONICS NL 7,249
- MITSUBISHI ELECTRIC CORPORATION JP 6,503
- ZHEJIANG UNIVERSITY 6,414
- DENSO CORPORATION JP 6,382