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PCE
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CPC Subgroup
G03F 1/54

Absorbers, e.g. of opaque materials

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Absorbers, e.g. of opaque materials

2 direct subcodes

Child Classifications

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  • G03F 1/56 Organic absorbers, e.g. of photo-resists
  • G03F 1/58 having two or more different absorber layers, e.g. stacked multilayer absorbers